---
publication_id: "OT-2026-000000350"
title: "Rinsing device for rinsing blue film at bottom of wafer"
published_at: "2026-09-15T19:02:46.803875Z"
canonical_url: "https://opentechnical.org/p/OT-2026-000000350"
categories:
  - "manufacturing-assembly-equipment/surface-treatment"
keywords:
  - "b08b3/041"
  - "b08b1/14"
  - "b08b1/165"
  - "b08b1/20"
  - "b08b1/34"
---

# Rinsing device for rinsing blue film at bottom of wafer

## Abstract

A rinsing device for rinsing a blue film at the bottom of a wafer, including: a base; a water tank; at least one drum disposed in the water tank and partially exposed and vertically protruded from the water tank; at least one drum driver; two vertically-movable scraper sets disposed at the base, flanking the water tank, and each having a scraper, a water collection chamber and a vertically-movable driver, with the scraper disposed above the water collection chamber, the water collection chamber disposed at the vertically-movable driver, and the vertically-movable driver disposed at the base and adapted to drive the water collection chamber and the scraper moving vertically; and a water tray disposed at the base, positioned at the water tank, and positioned below the two scrapers and the two water collection chambers.