---
publication_id: "OT-2026-000000659"
title: "Water-based, high-efficiency chemical reagent for substrate surface particle removal"
published_at: "2026-09-15T19:03:13.144742Z"
canonical_url: "https://opentechnical.org/p/OT-2026-000000659"
categories:
  - "manufacturing-assembly-equipment/surface-treatment"
keywords:
  - "b08b3/08"
  - "b08b3/041"
  - "b08b3/123"
  - "h01l21/02065"
  - "h01l21/02074"
---

# Water-based, high-efficiency chemical reagent for substrate surface particle removal

## Abstract

Embodiments of the disclosure provided herein include systems and methods for cleaning semiconductor substrates The method includes rotating a substrate disposed on a substrate support, spraying a front side of the substrate using a cleaning agent including one or more chelating agents through a front side nozzle assembly disposed above the substrate support, and spraying a back side of the substrate using the cleaning agent through a back side dispenser assembly disposed below the substrate support.