OPENTECHNICAL PUBLICATION
OT-2026-000000659

Water-based, high-efficiency chemical reagent for substrate surface particle removal

Published: 2026-09-15T19:03:13.144742Z
Permanent URL: https://opentechnical.org/p/OT-2026-000000659
Categories: Manufacturing & Assembly Equipment > Surface Treatment

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ABSTRACT

Embodiments of the disclosure provided herein include systems and methods for
cleaning semiconductor substrates The method includes rotating a substrate
disposed on a substrate support, spraying a front side of the substrate using
a cleaning agent including one or more chelating agents through a front side
nozzle assembly disposed above the substrate support, and spraying a back side
of the substrate using the cleaning agent through a back side dispenser
assembly disposed below the substrate support.

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OpenTechnical publication OT-2026-000000659
Published 2026-09-15T19:03:13.144742Z
https://opentechnical.org/p/OT-2026-000000659