---
publication_id: "OT-2026-000000864"
title: "Substrate processing apparatus using supercritical fluid and driving method thereof"
published_at: "2026-09-15T19:03:30.794039Z"
canonical_url: "https://opentechnical.org/p/OT-2026-000000864"
categories:
  - "manufacturing-assembly-equipment/surface-treatment"
keywords:
  - "b08b7/0021"
  - "h01l21/67028"
---

# Substrate processing apparatus using supercritical fluid and driving method thereof

## Abstract

A substrate processing apparatus includes a reactor having a processing space formed therein, a fluid supply unit supplying a supercritical fluid into the processing space of the reactor, and a controller controlling the reactor and the fluid supply unit. The controller controls, in response to whether a state of the supercritical fluid supplied to the reactor satisfies a set condition, the reactor and the fluid supply unit to perform one of cleaning of the processing space by using the supercritical fluid and drying of a substrate seated in the processing space by using the supercritical fluid.