OPENTECHNICAL PUBLICATION
OT-2026-000000864

Substrate processing apparatus using supercritical fluid and driving method thereof

Published: 2026-09-15T19:03:30.794039Z
Permanent URL: https://opentechnical.org/p/OT-2026-000000864
Categories: Manufacturing & Assembly Equipment > Surface Treatment

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ABSTRACT

A substrate processing apparatus includes a reactor having a processing space
formed therein, a fluid supply unit supplying a supercritical fluid into the
processing space of the reactor, and a controller controlling the reactor and
the fluid supply unit. The controller controls, in response to whether a state
of the supercritical fluid supplied to the reactor satisfies a set condition,
the reactor and the fluid supply unit to perform one of cleaning of the
processing space by using the supercritical fluid and drying of a substrate
seated in the processing space by using the supercritical fluid.

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OpenTechnical publication OT-2026-000000864
Published 2026-09-15T19:03:30.794039Z
https://opentechnical.org/p/OT-2026-000000864