{
  "abstract": "The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a treating bath having an accommodation space for accommodating a treating liquid; a support member configured to support at least one substrate in a vertical posture at the accommodation space; and a posture changing robot configured to change a posture of a substrate immersed in the treating liquid from the vertical posture to a horizontal posture, and wherein the posture changing robot comprises: a body configured to hold the substrate thereon; and a liquid supply member configured to supply a wetting liquid to the substrate placed on the body.",
  "assignees": [
    "SEMES CO LTD"
  ],
  "authors": [
    "CHOI JUN YOUNG",
    "JANG YOUNG JIN",
    "LIM JUN HYUN",
    "PARK GUI SU"
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  "published_at": "2026-09-15T19:05:09.868515Z",
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  "source_date": "2026-03-31",
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  "title": "Apparatus and method for treating substrate",
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