---
publication_id: "OT-2026-000001341"
title: "Apparatus and method for treating substrate"
published_at: "2026-09-15T19:05:09.868515Z"
canonical_url: "https://opentechnical.org/p/OT-2026-000001341"
categories:
  - "manufacturing-assembly-equipment/surface-treatment"
keywords:
  - "b08b11/02"
  - "h01l21/67718"
  - "h10p72/0416"
  - "h10p72/3211"
  - "b08b13/00"
  - "b08b13/00"
---

# Apparatus and method for treating substrate

## Abstract

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a treating bath having an accommodation space for accommodating a treating liquid; a support member configured to support at least one substrate in a vertical posture at the accommodation space; and a posture changing robot configured to change a posture of a substrate immersed in the treating liquid from the vertical posture to a horizontal posture, and wherein the posture changing robot comprises: a body configured to hold the substrate thereon; and a liquid supply member configured to supply a wetting liquid to the substrate placed on the body.