OPENTECHNICAL PUBLICATION
OT-2026-000001341

Apparatus and method for treating substrate

Published: 2026-09-15T19:05:09.868515Z
Permanent URL: https://opentechnical.org/p/OT-2026-000001341
Categories: Manufacturing & Assembly Equipment > Surface Treatment

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ABSTRACT

The inventive concept provides a substrate treating apparatus. The substrate
treating apparatus includes a treating bath having an accommodation space for
accommodating a treating liquid; a support member configured to support at
least one substrate in a vertical posture at the accommodation space; and a
posture changing robot configured to change a posture of a substrate immersed
in the treating liquid from the vertical posture to a horizontal posture, and
wherein the posture changing robot comprises: a body configured to hold the
substrate thereon; and a liquid supply member configured to supply a wetting
liquid to the substrate placed on the body.

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OpenTechnical publication OT-2026-000001341
Published 2026-09-15T19:05:09.868515Z
https://opentechnical.org/p/OT-2026-000001341