{
  "abstract": "The present disclosure is directed to methods and systems for depositing a material within a gap of a substrate in a cyclic deposition process. The methods and systems utilize an inhibitor to preferentially blocks chemisorption of a subsequently introduced first precursor at a portion of available chemisorption sites in the gap to promote deeper penetration of the first precursor into the gap and/or more uniform chemisorption of the first precursor in the gap used in forming a desired material.",
  "assignees": [
    "ASM IP HOLDING BV"
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  "authors": [
    "HAUKKA SUVI P",
    "SHARMA VARUN",
    "TOIS EVA E"
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  "source_date": "2026-03-19",
  "source_id": "US-2026077458-A1",
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  "supersedes": null,
  "title": "Methods and systems for deposition to gaps using an inhibitor",
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