OPENTECHNICAL PUBLICATION
OT-2026-000001672

Methods and systems for deposition to gaps using an inhibitor

Published: 2026-09-15T19:07:32.594034Z
Permanent URL: https://opentechnical.org/p/OT-2026-000001672
Categories: Tools & Tooling > Clamping Tools

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ABSTRACT

The present disclosure is directed to methods and systems for depositing a
material within a gap of a substrate in a cyclic deposition process. The
methods and systems utilize an inhibitor to preferentially blocks
chemisorption of a subsequently introduced first precursor at a portion of
available chemisorption sites in the gap to promote deeper penetration of the
first precursor into the gap and/or more uniform chemisorption of the first
precursor in the gap used in forming a desired material.

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OpenTechnical publication OT-2026-000001672
Published 2026-09-15T19:07:32.594034Z
https://opentechnical.org/p/OT-2026-000001672