OPENTECHNICAL PUBLICATION
OT-2026-000002827

Wafer transfer apparatus, wafer transfer system, and method for removing particles in wafer transfer apparatus

Published: 2026-09-15T19:15:36.927824Z
Permanent URL: https://opentechnical.org/p/OT-2026-000002827
Categories: Material Handling > Conveying Systems

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ABSTRACT

A wafer transfer apparatus includes a plate, a first belt unit on a first
surface of the plate and including a first linear motion (LM) guide movable up
and down, a second belt unit on the first surface of the plate and including a
second LM guide movable up and down, a robot between the first belt unit and
the second belt unit connected to the first LM guide and the second LM guide,
and configured to transfer a wafer in a vertical direction, and a buffer unit
between the first belt unit and the second belt unit in a first direction and
disposed between the plate and the robot in a second direction perpendicular
to the first direction, wherein the buffer unit includes a plurality of
centrifugal fans configured to discharge fluid from an inner space of the
buffer unit to an outside of the buffer unit.

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OpenTechnical publication OT-2026-000002827
Published 2026-09-15T19:15:36.927824Z
https://opentechnical.org/p/OT-2026-000002827