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This is a record of a document published elsewhere, first published by the United States Patent and Trademark Office, as US-12607972-B2, on 21 April 2026. OpenTechnical did not first disclose it. The identifier, hashes and timestamps below record what this library served and when, not when the material became public. View the original.

OT-2026-000000290

Method and apparatus for monitoring machine learning models

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Sensors, Controls & Machine Vision › Industrial Control
Original source
US-12607972-B2, the United States Patent and Trademark Office, 21 April 2026
Document SHA-256
25c8d81749899382ec2fa0797960e0cee7d8418a3e722b0025424633f6cd08e8

Abstract

A method includes training a first control model by utilizing a first set of input data as first input, resulting in a trained first control model; copying the trained first control model to a second control model, wherein, after copying, the second input layer and the plurality of second hidden layers is identical to the plurality of first hidden layers, and the first output layer is replaced by the second output layer; freezing the plurality of second hidden layers; training the second control model by utilizing the first set of input data as second input, resulting in a trained second control model; and running the trained second control model by utilizing a second set of input data as second input, wherein the second output outputs the quality measure of the first control model.

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Citation

OpenTechnical Publication OT-2026-000000290, “Method and apparatus for monitoring machine learning models,” published September 15, 2026 at 19:02:42 UTC, https://opentechnical.org/p/OT-2026-000000290.

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