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This is a record of a document published elsewhere, first published by the United States Patent and Trademark Office, as US-2026104245-A1, on 16 April 2026. OpenTechnical did not first disclose it. The identifier, hashes and timestamps below record what this library served and when, not when the material became public. View the original.

OT-2026-000000579

Method to determine an absolute position of an object, interferometer system, projection system and lithographic apparatus

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Classification
Sensors, Controls & Machine Vision › Position and Presence Sensing
Original source
US-2026104245-A1, the United States Patent and Trademark Office, 16 April 2026
Document SHA-256
806e0bd8f703af2e2c5d645050a074edfc3ec122e404ba62b540be8823d8fde8

Abstract

The invention provides a method to determine an absolute position of an object using an interferometer system, comprising the steps of: providing a light beam; splitting the light beam in a measurement beam and a reference beam; guiding the measurement beam along a measurement path towards a reflective measurement surface on the object; guiding the reference beam along a reference path towards a reflective reference surface on a reference object; receiving the measurement beam after reflection on the reflective measurement surface and the reference beam after reflection on the reflective reference surface at a detector; measuring a phase signal based on the measurement beam and the reference beam received by the detector, separating a cyclic error phase component from the phase signal, determining the absolute position of the object on the basis of the cyclic error phase component.

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OpenTechnical Publication OT-2026-000000579, “Method to determine an absolute position of an object, interferometer system, projection system and lithographic apparatus,” published September 15, 2026 at 19:03:06 UTC, https://opentechnical.org/p/OT-2026-000000579.

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