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This is a record of a document published elsewhere, first published by the United States Patent and Trademark Office, as US-12601585-B2, on 14 April 2026. OpenTechnical did not first disclose it. The identifier, hashes and timestamps below record what this library served and when, not when the material became public. View the original.

OT-2026-000000673

Endpoint detection method for chamber component refurbishment

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Sensors, Controls & Machine Vision › Position and Presence Sensing
Original source
US-12601585-B2, the United States Patent and Trademark Office, 14 April 2026
Document SHA-256
28457074baee83d2aea9bae13772ae8b4a861bdbf7f3263a95722c2eedfb96eb

Abstract

An endpoint detection system for use in detecting an endpoint of a refurbishment process for process chamber components. The refurbishment process involves use of an etchant bath to etch or clean chamber components after their use a reaction chamber in semiconductor processing to remove deposited materials including oxide films or the like. The endpoint detection system is configured to use measurements of reflected electromagnetic radiation from surfaces of the component in an etchant bath, transmitted electromagnetic radiation passing through holes in the chamber component while the component is in the etchant bath, or both to detect process endpoints. The process endpoints can coincide with a desired amount of removal of the deposited materials from surfaces and/or through holes in the chamber component. Upon detection of the endpoints, the chamber component can be removed from the etchant to limit over etching of materials from the chamber component to increase useful life.

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Citation

OpenTechnical Publication OT-2026-000000673, “Endpoint detection method for chamber component refurbishment,” published September 15, 2026 at 19:03:14 UTC, https://opentechnical.org/p/OT-2026-000000673.

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