Abstract
A thin film thickness measuring apparatus includes: an ultrasonic retroreflector that is provided under a test object formed in the shape of a thin film and retroreflects an ultrasonic wave incident through the test object; an ultrasonic wave input portion that is provided on one side of the test object and inputting an ultrasonic wave to one side of the test object; and a measurement portion that is connected to the ultrasonic wave input portion and measures an arrival time of the ultrasonic wave reflected through the test object.