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This is a record of a document published elsewhere, first published by the United States Patent and Trademark Office, as US-12599937-B2, on 14 April 2026. OpenTechnical did not first disclose it. The identifier, hashes and timestamps below record what this library served and when, not when the material became public. View the original.

OT-2026-000000659

Water-based, high-efficiency chemical reagent for substrate surface particle removal

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Classification
Manufacturing & Assembly Equipment › Surface Treatment
Original source
US-12599937-B2, the United States Patent and Trademark Office, 14 April 2026
Document SHA-256
451ffe376474a484b8fe643f5b84b025f67ffaacf142e111b633ee89598931c2

Abstract

Embodiments of the disclosure provided herein include systems and methods for cleaning semiconductor substrates The method includes rotating a substrate disposed on a substrate support, spraying a front side of the substrate using a cleaning agent including one or more chelating agents through a front side nozzle assembly disposed above the substrate support, and spraying a back side of the substrate using the cleaning agent through a back side dispenser assembly disposed below the substrate support.

Publication information

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Citation

OpenTechnical Publication OT-2026-000000659, “Water-based, high-efficiency chemical reagent for substrate surface particle removal,” published September 15, 2026 at 19:03:13 UTC, https://opentechnical.org/p/OT-2026-000000659.

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This record reproduces a document published elsewhere and is provided for reference and study. Rights in the original remain with its owner. See the publication policy.