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This is a record of a document published elsewhere, first published by the United States Patent and Trademark Office, as US-12599938-B2, on 14 April 2026. OpenTechnical did not first disclose it. The identifier, hashes and timestamps below record what this library served and when, not when the material became public. View the original.

OT-2026-000000864

Substrate processing apparatus using supercritical fluid and driving method thereof

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Manufacturing & Assembly Equipment › Surface Treatment
Original source
US-12599938-B2, the United States Patent and Trademark Office, 14 April 2026
Document SHA-256
7ea69d6116524876bafc583de993eccf87b8df46ea36f96ac6a43cb151a1d087

Abstract

A substrate processing apparatus includes a reactor having a processing space formed therein, a fluid supply unit supplying a supercritical fluid into the processing space of the reactor, and a controller controlling the reactor and the fluid supply unit. The controller controls, in response to whether a state of the supercritical fluid supplied to the reactor satisfies a set condition, the reactor and the fluid supply unit to perform one of cleaning of the processing space by using the supercritical fluid and drying of a substrate seated in the processing space by using the supercritical fluid.

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Citation

OpenTechnical Publication OT-2026-000000864, “Substrate processing apparatus using supercritical fluid and driving method thereof,” published September 15, 2026 at 19:03:30 UTC, https://opentechnical.org/p/OT-2026-000000864.

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