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This is a record of a document published elsewhere, first published by the European Patent Office, as EP-4696294-A1, on 18 February 2026. OpenTechnical did not first disclose it. The identifier, hashes and timestamps below record what this library served and when, not when the material became public. View the original.

OT-2026-000002783

Gait training pattern generation method and gait training apparatus

Published
Permanent URL
Classification
Robotics & Automation › Robot Architectures
Inventors
LEE KYUNG HWAN, PARK KWANG HUN
Assignee
P&S ROBOTICS CO LTD
Original source
EP-4696294-A1, the European Patent Office, 18 February 2026
Document SHA-256
5305919f25f83cd509601ebaf93011704cc7cf35ef298f6fe3a87d24bd210920

Abstract

The present invention relates to: a gait training pattern generation method for generating a gait training pattern optimized for a gait trainee; and a gait training apparatus. The gait training pattern generation method may comprise the steps of: obtaining information about the lower body of a gait trainee; setting gait training conditions for the gait trainee; and generating a gait training pattern according to the information about the lower body of the gait trainee and the gait training conditions.

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Citation

OpenTechnical Publication OT-2026-000002783, “Gait training pattern generation method and gait training apparatus,” published September 15, 2026 at 19:15:19 UTC, https://opentechnical.org/p/OT-2026-000002783.

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