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This is a record of a document published elsewhere, first published by the United States Patent and Trademark Office, as US-2026104696-A1, on 16 April 2026. OpenTechnical did not first disclose it. The identifier, hashes and timestamps below record what this library served and when, not when the material became public. View the original.

OT-2026-000000490

Optimization of fabrication processes

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Sensors, Controls & Machine Vision › Industrial Control
Original source
US-2026104696-A1, the United States Patent and Trademark Office, 16 April 2026
Document SHA-256
d48510128d132541207427f65e622a7320b06134b57c1c2800f998f2a7d8c9e9

Abstract

Methods, systems, and media for optimization of fabrication processes are provided. In some implementations, a method of automatically optimizing fabrication processes comprises: (a) providing a first set of process parameter values associated with a first experiment to a model representing a fabrication process; (b) characterizing a statistical uncertainty of predictions made by the model; (c) using an acquisition function to select a second set of process parameter values, wherein the acquisition function identifies the second set of process parameters based on both: (i) a difference between predicted wafer characteristics and a target specification; and (ii) the statistical uncertainty; (d) receiving results of the fabrication process performed using the second set of process parameter values; and (e) determining whether the performance of the fabrication process generates a post-processed wafer having wafer characteristics that meet the target specification.

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OpenTechnical Publication OT-2026-000000490, “Optimization of fabrication processes,” published September 15, 2026 at 19:02:57 UTC, https://opentechnical.org/p/OT-2026-000000490.

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