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This is a record of a document published elsewhere, first published by the United States Patent and Trademark Office, as US-2026104096-A1, on 16 April 2026. OpenTechnical did not first disclose it. The identifier, hashes and timestamps below record what this library served and when, not when the material became public. View the original.

OT-2026-000000537

Valve and substrate processing apparatus

Published
Permanent URL
Classification
Industrial Motion & Power Transmission › Fluid Power
Original source
US-2026104096-A1, the United States Patent and Trademark Office, 16 April 2026
Document SHA-256
aeaf92156d7a844175fd2483628a93832f5689355ae4242f1d556769ef1d8de7

Abstract

A valve includes: a housing having a flow path of fluid in the housing; and a valve body provided rotatably with respect to the housing, and configured to open and close the flow path, wherein the housing has a housing seal surface that surrounds the flow path, wherein the valve body has a valve body seal surface, which is formed on an outer periphery portion of the valve body and faces the housing seal surface when the valve body is located at a closing position for closing the flow path, and wherein the valve body seal surface faces a closing rotation direction of the valve body for closing the flow path, over an entire circumference of the outer periphery portion.

Publication information

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Citation

OpenTechnical Publication OT-2026-000000537, “Valve and substrate processing apparatus,” published September 15, 2026 at 19:03:02 UTC, https://opentechnical.org/p/OT-2026-000000537.

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