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This is a record of a document published elsewhere, first published by the United States Patent and Trademark Office, as US-2026091521-A1, on 2 April 2026. OpenTechnical did not first disclose it. The identifier, hashes and timestamps below record what this library served and when, not when the material became public. View the original.

OT-2026-000001214

System of processing substrate, transfer method, transfer program, and holder

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Classification
Robotics & Automation › Robot Architectures
Inventors
KAISE SEIICHI, NUMAKURA MASAHIRO, TAKEYAMA YUKI, TOYOMAKI TOSHIAKI
Assignee
TOKYO ELECTRON LTD
Original source
US-2026091521-A1, the United States Patent and Trademark Office, 2 April 2026
Document SHA-256
78d23396fd8a228f16418b8221b005a40782da3f14c10c1c0e443f70efa11ccd

Abstract

A system of processing a substrate includes an atmospheric-pressure transfer chamber, at least one vacuum processing chamber, at least two load-lock modules, a vacuum transfer chamber, a plurality of load ports, and a first transfer mechanism and a second transfer mechanism. The load ports are attached to the atmospheric-pressure transfer chamber and detachable containers are mounted on the load ports, respectively. A controller controls the first transfer mechanism and the second transfer mechanism to concurrently transfer a used consumable from the containers to the vacuum processing chamber through the atmospheric-pressure transfer chamber and one of the load-lock modules and to transfer a used consumable from the vacuum processing chamber through the vacuum transfer chamber and another one of the load-lock modules.

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Citation

OpenTechnical Publication OT-2026-000001214, “System of processing substrate, transfer method, transfer program, and holder,” published September 15, 2026 at 19:04:11 UTC, https://opentechnical.org/p/OT-2026-000001214.

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