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This is a record of a document published elsewhere, first published by the United States Patent and Trademark Office, as US-12593649-B2, on 31 March 2026. OpenTechnical did not first disclose it. The identifier, hashes and timestamps below record what this library served and when, not when the material became public. View the original.

OT-2026-000001341

Apparatus and method for treating substrate

Published
Permanent URL
Classification
Manufacturing & Assembly Equipment › Surface Treatment
Inventors
CHOI JUN YOUNG, JANG YOUNG JIN, LIM JUN HYUN, PARK GUI SU
Assignee
SEMES CO LTD
Original source
US-12593649-B2, the United States Patent and Trademark Office, 31 March 2026
Document SHA-256
98369d25ed6011174651c84d7ebecc4d89542697521ede91cdc50cc58b36e04d

Abstract

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a treating bath having an accommodation space for accommodating a treating liquid; a support member configured to support at least one substrate in a vertical posture at the accommodation space; and a posture changing robot configured to change a posture of a substrate immersed in the treating liquid from the vertical posture to a horizontal posture, and wherein the posture changing robot comprises: a body configured to hold the substrate thereon; and a liquid supply member configured to supply a wetting liquid to the substrate placed on the body.

Publication information

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Citation

OpenTechnical Publication OT-2026-000001341, “Apparatus and method for treating substrate,” published September 15, 2026 at 19:05:09 UTC, https://opentechnical.org/p/OT-2026-000001341.

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This record reproduces a document published elsewhere and is provided for reference and study. Rights in the original remain with its owner. See the publication policy.