OpenTechnical
This is a record of a document published elsewhere, first published by the United States Patent and Trademark Office, as US-2026077458-A1, on 19 March 2026. OpenTechnical did not first disclose it. The identifier, hashes and timestamps below record what this library served and when, not when the material became public. View the original.

OT-2026-000001672

Methods and systems for deposition to gaps using an inhibitor

Published
Permanent URL
Classification
Tools & Tooling › Clamping Tools
Inventors
HAUKKA SUVI P, SHARMA VARUN, TOIS EVA E
Assignee
ASM IP HOLDING BV
Original source
US-2026077458-A1, the United States Patent and Trademark Office, 19 March 2026
Document SHA-256
42e14d139effc46a96de929e6b30120d3d76182ac15766165989fbccbf3e4f7e

Abstract

The present disclosure is directed to methods and systems for depositing a material within a gap of a substrate in a cyclic deposition process. The methods and systems utilize an inhibitor to preferentially blocks chemisorption of a subsequently introduced first precursor at a portion of available chemisorption sites in the gap to promote deeper penetration of the first precursor into the gap and/or more uniform chemisorption of the first precursor in the gap used in forming a desired material.

Publication information

Plain textMarkdownManifestIntegrity record

Citation

OpenTechnical Publication OT-2026-000001672, “Methods and systems for deposition to gaps using an inhibitor,” published September 15, 2026 at 19:07:32 UTC, https://opentechnical.org/p/OT-2026-000001672.

To cite specific content, add the paragraph or figure numbers.

Terms

This record reproduces a document published elsewhere and is provided for reference and study. Rights in the original remain with its owner. See the publication policy.